ISSN:
1662-0356
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Natural Sciences in General
,
Technology
Notes:
CaCu3Ti4O12 (CCTO) thin films have been successfully deposited by Metal OrganicChemical Vapor Deposition (MOCVD) technique. A novel approach based on a molten multicomponentprecursor source has been applied. The molten mixture consists of theCa(hfa)2•tetraglyme, Ti(tmhd)2(O-iPr)2, and Cu(tmhd)2 [Hhfa= 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; tetraglyme= 2,5,8,11,14-pentaoxapentadecane; Htmhd= 2,2,6,6-tetramethyl-3,5-heptandione; O-iPr= iso-propoxide] precursors. Film complete structural and morphologicalcharacterizations have been carried out using several techniques [X-ray diffraction (XRD), scanningelectron microscopy (SEM), transmission electron microscopy (TEM)]
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/42/transtech_doi~10.4028%252Fwww.scientific.net%252FAST.45.1194.pdf
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