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  • Articles: DFG German National Licenses  (87)
  • 1995-1999  (81)
  • 1960-1964  (6)
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 2237-2244 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We use secondary ion mass spectrometry to characterize the hydrogen/deuterium distribution and concentration on complimentary "metal" oxide silicon (CMOS) test structures subjected to molecular deuterium (D2) anneals. We examine the temperature dependence and the influence of doping on the transport of deuterium to the gate oxide interfaces resulting in interface passivation. We find that undoped polycrystalline silicon appears to be an efficient barrier for deuterium transport at typical postmetallization sintering temperatures. We also examine the permeability of device structures that include dielectric encapsulation layers after typical postmetal sintering conditions employed in a conventional CMOS process flow. It is found that typical low temperature deposited oxide dielectrics are quite permeable by molecular deuterium at typical sintering temperatures (435 °C). In contrast, chemical vapor deposited silicon nitride dielectrics appear to form a complete barrier to deuterium diffusion (even for layers as thin as 300 Å). We also find that nitrides which receive a high thermal budget exposure, such as the source/drain anneal, appears to regain permeability to deuterium diffusion/transport. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 66 (1995), S. 5214-5217 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We describe an optically driven x-ray diode which can generate nanosecond, hard x-ray pulses at a repetition rate of 300 Hz, with high stability and a synchronization capability of 1–2 ns. The system is suitable for nanosecond time resolved diffraction experiments. Using this system diffraction patterns from liquids and polycrystalline solids were recorded. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have investigated the use of Pb and Au as surfactants in an attempt to achieve smoother and sharper interfaces in three types of giant magnetoresistance (GMR) spin valve multilayers: symmetric spin valves, bottom spin valves, and top spin valves. The coupling fields are reduced by a factor of 10 for symmetric and bottom spin valves and by a factor of 3 for top spin valves, presumably by suppressing roughness and interdiffusion at the Co/Cu/Co interfaces, when ∼1 monolayer of Pb is deposited in the early stages of spin valve growth. The Pb has a strong tendency to float out or segregate to the surface during deposition of the spin valve leaving the GMR largely unaltered. Au is almost as effective as Pb, however the Au tends to be left behind in the spin valve, and the GMR is reduced slightly. Attempts to use Hg as a surfactant were unsuccessful. The coupling field increased, and the GMR decreased sharply. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 5616-5624 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The Al-Ga interdiffusion induced by Si focused ion beam implantation and subsequent rapid thermal annealing (RTA) was investigated in an Al0.3Ga0.7As/GaAs superlattice structure with equal 3.5 nm barrier and well widths. Si++ was accelerated to either 50 or 100 kV and implanted parallel to sample normal at doses ranging from 1013 to 1015/cm2. The effect of rapid thermal anneal of 10 s at 950 °C was characterized by the secondary ion mass spectrometry technique. In the implanted region, the interdiffusion causing compositional mixing was significantly enhanced by the Si implantation. An ion dose as low as 1×1014/cm2 results in a two-order of magnitude increase in the interdiffusion coefficient, to a value of 4.5×10−14 cm2/s, producing a mixing effectiveness of ∼90%. In contrast, the RTA-only case produces an interdiffusion coefficient of 1.3×10−16 cm2/s and very little mixing. A strong depth dependence of the mixing process was observed at 100 keV implantation energy, with a "pinch-off'' (more heavily mixed) region being formed at a certain depth. It is noticed that the depth where this enhancement occurred is not associated with either the maximum concentration of Si ions or of vacancies. Instead, it coincides with the positive maximum of the second derivative of the vacancy profile, which in turn represents a maximum in the vacancy injection generated by the presence of a transient vacancy concentration gradient. Based on these findings, a theoretical model was developed using vacancy injection as responsible for mixing. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have investigated the use of various alloys as substitutes for pure Co in the center film of symmetric spin valves of the type NiO/Co/Cu/Co/Cu/Co/NiO. The aim of this work is to identify magnetic materials that exhibit smaller coercivities than pure Co for the center or "valve'' film but which retain much of the giant magnetoresistance associated with a pure Co film. The materials investigated include Co95Fe5, Co90Fe10, Ni80Fe20, Co86Fe10.5Ni3.5, and Co85B15. It appears that each of these alloys scatters electrons more strongly than does pure Co as they cross the center film. This scattering degrades the dual spin-valve effect, which is the primary advantage of the symmetric spin valve. As a result, a tradeoff exists between large GMR and small coercivity when using these materials. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have attempted to optimize the values of the giant magnetoresistance in symmetric spin valves of the type NiO/Co/Cu/Co/Cu/Co/NiO (achieving 23.4%) and in bottom spin valves of the type Co/Cu/Co/NiO (achieving 17.0%), the largest values ever reported for such structures. The key elements in this achievement are improved vacuum conditions and careful attention to the film thicknesses. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 2491-2496 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have investigated the use of In as a surfactant to achieve smoother interfaces in spin-valve multilayers of the general type: FeMn/Ni80Fe20/Co/Cu/Co/Ni80Fe20/glass. The coupling field is reduced from ∼0.8 to ∼0.3 mT, presumably by suppressing roughness at the Co/Cu/Co interfaces, when 0.5–1.0 nm In is deposited on the first Co film just prior to Cu deposition or on the Cu film just prior to deposition of the second Co film. The In has a strong tendency to float-out to the surface during deposition of the spin valve leaving the spin-valve layers largely intact. The exchange bias at the FeMn/Ni80Fe20 interface can be increased from 12 to 25 mT by the use of thicker In (1.4 nm). © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 282-290 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have investigated the dependence of the giant magnetoresistance (GMR) effect, the coercivity, the coupling field, and the resistivity on film deposition at low-substrate temperatures (150 K) in spin valve multilayers of the general type: FeMn/Ni80Fe20/Co/Cu/Co/Ni80Fe20/glass. Low substrate temperatures tend to suppress both thermally activated surface diffusion of deposited atoms and interdiffusion at interfaces, which often occur during thin-film deposition at room temperature. We find significant increases in the GMR, significant reductions in the magnetic coupling across the Cu layer, slight reductions in the coercivity of the unpinned film, and slight reductions in the resistivity depending on which parts of the multilayer are deposited at low temperature. When the entire film is deposited at 150 K we obtain a GMR of 8.8% at a coercivity of less than 0.5 mT (5 Oe). © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 81 (1997), S. 3186-3195 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have examined the kinetics of carrier relaxation in GaAs/AlGaAs quantum wells (QWs), quantum wires (QWRs), and quantum boxes (QBs) with time-resolved cathodoluminescence (CL). In the cases of QWRs and QBs, the nanostructures were grown via a size-reducing growth approach on pre-patterned GaAs(001) substrates composed of stripes and mesas, respectively. The growth involved deposition of multiple GaAs/AlGaAs layers in order to establish both structural and optical markers which facilitated the identification of important features in transmission electron microscopy (TEM) and CL experiments. In TEM measurements, the lateral dimensions of the top-most GaAs layers in typical stripe and mesa structures comprising the QWRs and QBs delineate GaAs regions expected to exhibit 2D and 3D quantum confinement effects, respectively. Time-delayed CL spectra of all three structures reveal that the initial capture of carriers in the active regions occurs on a time scale less than the temporal resolution of the CL system, ∼100 ps, during the onset of luminescence. Hot carriers, as a result of re-emission out of thin QWs surrounding the QWRs and QBs, exhibit diffusive transport followed by relaxation into laterally confined regions which exhibit confined states of lower energy. This thermalization gives rise to a relatively slow onset and decay of luminescence attributed to the lowest energy optical transitions. By comparing time-resolved CL transients in these three structures, we find that the average luminescence onset and initial-decay rates both decrease as the dimensionality of the system reduces from 2D to 0D. These results demonstrate that the rate of carrier relaxation, including the re-emission and diffusive transport of carriers, will depend on details of the total surrounding structure which comprises the excitation region. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 73 (1998), S. 1841-1843 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A method to independently manipulate the density and size of stress-driven self-assembled quantum dots (QDs) is demonstrated in the InAs/GaAs material system. In bilayer stacks, different InAs deposition amounts in the initial (seed) and second layer are shown to enable independent control, respectively, of the density and the size distribution of the second layer QDs. The approach allows enhancing the average volume and improving the uniformity of InAs QDs, resulting in, respectively, low and room temperature photoluminescence at 1.028 eV (∼1.2 μm) and 0.955 eV (∼1.3 μm) with remarkably narrow linewidths of 25 and 29 meV for 1.74 ML (seed)/3.00 ML InAs stacking. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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