ISSN:
1432-0630
Keywords:
33.20.Fb
;
47.25.Qv
;
81.15.Gh
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Abstract The suitability of local temperature measurements by cw Raman spectroscopy for the CH4/H2 CVD system has been established. The temperature profiles in a model reactor were derived from H2 pure rotational lines and from hot bands of thev 1 vibrational band of CH4. Experimental results are presented for substrate temperatures of 773 K and of 1473 K. High accuracy of measurement and excellent agreement with theoretical solutions for the temperature field within the reactor were found.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF00614773
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