ISSN:
0167-9317
Keywords:
CMOS technology
;
Silicon process technology
;
device isolation
;
selective epitaxial growth
;
silicon vapor phase epitaxy
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
Type of Medium:
Electronic Resource
URL:
http://linkinghub.elsevier.com/retrieve/pii/0167-9317(86)90003-1
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