ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
In the semiconductor industry, a device that can measure the surface-profile of photoresistis needed. Since the photoresist surface is very smooth and deformable, the device is required tomeasure vertical direction with nanometer resolution and not to damage it at the measurement. Wedeveloped the apparatus using multi-cantilever and white light interferometer to measure thesurface-profile of thin film. But, this system with scanning method suffers from the presence ofmoving stage and systematic sensor errors. So, in this paper, an error separation approach usedcoupled distance sensors, together with an autocollimator as an additional angle measuring device,was consulted the potentiality for self-calibration of multi-cantilever. Then, according to this method,we constructed the experimental apparatus and do the measurement on the resist film. The resultsdemonstrated the feasibility that the constructed multi-ball-cantilever AFM system combined with anautocollimator could measure the thin film with high accuracy
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/57/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.381-382.407.pdf
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