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  • Articles: DFG German National Licenses  (4)
Source
  • Articles: DFG German National Licenses  (4)
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  • 1
    Electronic Resource
    Electronic Resource
    Thermal conduction in metallized silicon-dioxide layers on silicon (1994)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 65 (1994), S. 1629-1631 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The vertical thermal conductivities of thermally grown (TG) and chemical vapor deposited (CVD) silicon-dioxide layers 20 to 200 nm thick are measured using a simple, noncontact photothermal technique. The conductivities of TG and CVD layers are less by as much as 18% and 30%, respectively, than the conductivity of bulk fused silicon dioxide. No significant thickness dependence is observed. The thermal boundary resistance between the oxide layers and silicon is shown to be negligibly small. The boundary resistance of gold layers sputtered directly onto TG oxide is considerably larger than that of gold layers evaporated on TG oxide with a 20-nm chromium adhesion layer, and is comparable to internal resistances of the oxide layers.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.112933
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Transient thermal gratings at surfaces for thermal characterization of bulk materials and thin films (1995)
    Springer
    Applied physics 61 (1995), S. 253-261 
    Details
    ISSN: 1432-0630
    Keywords: PACS07.20.-n; 44.10.+i; 44.30.+v
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract. Transient Thermal Gratings (TTGs) at surfaces of absorbing materials have been utilized for investigating heat diffusion in bulk materials and thin films. In this report, we describe the theoretical background of the technique and present experimental data. TTGs were excited in the surface plane by interference of two pulsed laser beams and monitored by a cw probe beam, either via temperature dependence of the reflectivity or by deflection from the displacement pattern. A theoretical model describing the thermal and thermoelastic surface response was developed, both for a homogeneous material and a multilayer structure. The potential of the technique will be demonstrated by experimental results on (i) thermal diffusivities of bulk materials, (ii) anisotropic lateral heat transport, and (iii) thermal diffusivities of metal and diamond films. Furthermore, we will show that TTGs allow thermal depth profiling of inhomogeneous materials whenever there is a vertical gradient in thermal conductivity.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01538190
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    Paper (German National Licenses)
    Fulltext
  • 3
    Electronic Resource
    Electronic Resource
    Transient thermal gratings at surfaces for thermal characterization of bulk materials and thin films (1995)
    Springer
    Applied physics 61 (1995), S. 253-261 
    Details
    ISSN: 1432-0630
    Keywords: 07.20.−n ; 44.10.+i ; 44.30.+v
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Transient Thermal Gratings (TTGs) at surfaces of absorbing materials have been utilized for investigating heat diffusion in bulk materials and thin films. In this report, we describe the theoretical background of the technique and present experimental data. TTGs were excited in the surface plane by interference of two pulsed laser beams and monitored by a cw probe beam, either via temperature dependence of the reflectivity or by deflection from the displacement pattern. A theoretical model describing the thermal and thermoelastic surface response was developed, both for a homogeneous material and a multilayer structure. The potential of the technique will be demonstrated by experimental results on (i) thermal diffusivities of bulk materials, (ii) anisotropic lateral heat transport, and (iii) thermal diffusivities of metal and diamond films. Furthermore, we will show that TTGs allow thermal depth profiling of inhomogeneous materials whenever there is a vertical gradient in thermal conductivity.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01538190
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    Paper (German National Licenses)
    Fulltext
  • 4
    Electronic Resource
    Electronic Resource
    The influence of thermal diffusion on laser ablation of metal films (1994)
    Springer
    Applied physics 58 (1994), S. 129-136 
    Details
    ISSN: 1432-0630
    Keywords: 68.60.Dv ; 79.20.Ds
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Single-shot ablation thresholds of nickel and gold films in the thickness range from 50 nm to 7 μm have been measured for 14 ns laser pulses at 248 nm, using photoacoustic shock wave detection in air. The metal films were deposited on fused silica substrates. The ablation threshold was found to increase linearly with film thickness up to the thermal diffusion length of the film. Beyond this point it remains independent of film thickness. The proportionality between threshold fluence and thickness allows the prediction of ablation thresholds of metal films from the knowledge of their optical properties, evaporation enthalpies and thermal diffusivities. Physically it proves that ablation is driven by the energy density determined by the thermal diffusion length. A simple thermodynamic model describes the data well. Thermal diffusivities, an essential input for this model, were measured using the technique of transient thermal gratings. In addition, the substrate dependence of the ablation threshold was investigated for 150 nm Ni films.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00332169
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    Paper (German National Licenses)
    Fulltext
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