ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Fabrication technology for lead-alloy Josephson devices was evaluated from the viewpoint of application to large-scale integrated circuits. Metal and insulating layers used in the circuits were evaluated, and optimization of techniques for deposition or formation of these layers was investigated. Metallization of the Pb-In-Au base electrode and the Pb-Bi counterelectrode was studied in terms of optimizing the deposited films, to improve the reliability of junction electrodes. The formation of the oxide barrier was studied by in situ ellipsometry. SiOx deposited in oxygen was developed as the insulation layer with less defect density than conventional SiO. A liftoff technique using toluene soaking was developed, and patterns with a minimum line width of 2 μm were consistently reproduced. The characteristics of each element in the circuits were evaluated for test vehicles. For the junction, the following items were evaluated: controllability of the critical current Ic, junction quality, Ic uniformity, junction yield, and thermal cycling and storage stability. For the peripheral elements, integrity of lines and contacts, and characteristics of resistors were evaluated. 8-kbit memory cell arrays with a full vertical structure were fabricated to evaluate these technologies in combination. The continuity of each metal layer and insulation between metal layers were evaluated with an autoprober at room temperature. For selected chips, cell characteristics have been measured, and their Ic uniformity and production yields for cells are discussed. Normal operation of the memory cells was confirmed for all of the 24 accessible cells on a chip. Finally, we discuss the feasibility of Josephson large-scale integrated circuits using lead-alloy materials.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.336437
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