Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
64 (1988), S. 5440-5442
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The magnetic anisotropy in Ni films deposited on Pyrex glass substrates by different sputtering methods, i.e., ion beam sputtering (IBS), triode rf sputtering, and diode rf sputtering, was studied in relation to the internal stress in the films. Strong in-plane easy magnetic anisotropy (Ku=−4.9×105 erg/cm3) was observed in IBS Ni films. The average in-plane stress in the IBS film was estimated from the radius of convex curvature of the disk substrate as large as −1.2×1010 dyn/cm2 (a negative sign implies the compressive stress), which is due to the atomic peening effect by kinetic incident atoms during deposition. The stress-induced magnetic anisotropy is calculated to be about −1.2×106 erg/cm3, which is overwhelming to the observed magnetic anisotropy in the IBS Ni film. Positive Ku and tensile internal stress, one or two order of magnitude smaller in absolute values than that in IBS film, were observed in Ni films prepared by the other sputtering methods.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.342340
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