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  • Electronic Resource  (4)
  • 1985-1989  (4)
  • 1989  (4)
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  • Electronic Resource  (4)
Years
  • 1985-1989  (4)
Year
  • 1
    Electronic Resource
    Electronic Resource
    Adhesion and deformation of metal/polyimide layered structures (1989)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 65 (1989), S. 1911-1917 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Adhesion and interfacial failure of Cr, Cu, and Cu/Cr films on a thin pyromellitic dianhydride-oxydianiline polyimide substrate have been investigated using a recently developed stretch deformation technique. This method directly measures the energy required to separate the interface from the difference in the load versus elongation curves between film/substrate and substrate structures. The failure mode was observed in combination with morphological studies by in situ optical microscopy and scanning and transmission electron microscopies. The stress distribution in the sample upon stretching has been computed by a finite element analysis. The difference in the stress relief modes, film fracture, and delamination behavior for Cu versus Cr films is discussed. The important role of crack formation in the metal overlayer for initiating failure is demonstrated. The effects due to the addition of a brittle Cr interface layer between polyimide and Cu on the buildup of stress and the onset of failure have also been investigated.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.342903
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    New field-effect resonant tunneling transistor: Observation of oscillatory transconductance (1989)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 2742-2744 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We present device characteristics of a field-effect, unipolar, resonant tunneling transistor. An oscillatory tunneling current in the transfer characteristics is observed for the first time. Our observation confirms a recent hypothesis that a mere three-to-two dimensional resonant tunneling can occur when scattering rate is less than the attempt frequency of tunneling electrons in the quantum well.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.101940
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    Paper (German National Licenses)
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  • 3
    Electronic Resource
    Electronic Resource
    Implant and annealed ohmic contact to a thin quantum well (1989)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 55 (1989), S. 1650-1652 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We demonstrate for the first time that ion implantation and implant activation annealing, combined with a heavily doped InGaAs surface layer, can be used to make nonalloying shallow ohmic contact to an n-type InGaAs (or GaAs) quantum well. Quantum Hall effect and Shubnikov–de Haas oscillations are clearly observed, which indicates that electrons in the quantum well remain two dimensional despite the post-implantation high-temperature annealing. This technique can be applied to devices that would need to make shallow ohmic contact to a thin (∼100 A(ring) or less) quantum well, where existing selective etching approaches fail to work.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.102227
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    Paper (German National Licenses)
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  • 4
    Electronic Resource
    Electronic Resource
    Interface properties of HgCdTe metal-insulator-semiconductor capacitors (1989)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 265-267 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The conductance method has been used to measure the density of interface states of the ZnS/Hg0.775Cd0.225Te metal-insulator-semiconductor (MIS) system with three different HgCdTe surface treatments. It is found that the density of fast interface states increases from ∼1011 eV−1 cm−2 at the conduction-band minimum to ∼1013 eV−1 cm−2 near the valence-band maximum. In addition, the interface states located in the lower part of the band gap communicate with the valence band so efficiently that the effective band gap is reduced. Our observations explain why the p-type MIS photodiode is superior to the n-type version in terms of breakdown voltage and storage time.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.100985
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    Paper (German National Licenses)
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