Electronic Resource
New York, NY [u.a.]
:
Wiley-Blackwell
Advanced Materials for Optics and Electronics
4 (1994), S. 55-74
ISSN:
1057-9257
Keywords:
Microlithography
;
X-ray lithography
;
Electron-beam lighography
;
Photolithography lon-beam lithography
;
Resists
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Electrical Engineering, Measurement and Control Technology
,
Physics
Additional Material:
24 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/amo.860040203
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