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  • Electronic Resource  (2)
  • 1995-1999  (2)
  • Chemistry  (2)
  • x-ray diffraction  (1)
  • 1
    ISSN: 0887-6266
    Keywords: oriented fluoro-oligomers ; chemical vapor deposition ; ferroelectricity ; glass transition ; Brillouin spectroscopy ; x-ray diffraction ; vinylidene fluoride ; trifluoroethylene ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Notes: The room temperature phase of the physical/chemical vapor-deposited statistical co-oligomer VDF/TrFE(70/30) has been characterized by different experimental methods such as small-angle x-ray scattering, wide-angle x-ray diffraction, size-exclusion chromatography, infrared absorption and optical refractometry. The characterization of the elastic properties was carried out using high-performance Brillouin spectroscopy in connection with special scattering geometries. The co-oligomer VDF/TrFE(70/30) was obtained by cracking the parent statistical copolymer and subsequently vapor depositing the shortened chains on highly oriented PTFE substrates (PIA-technique). The room temperature phase of the resulting oriented waxy crystal mats of VDF/TrFE(70/30) is predominantly ferroelectric. The physical properties are very different to those of similarly PIA-prepared n-alkanes, perfluoroalkanes, and blockfluoroalkanes. The microstructure of VDF/TrFE(70/30) is interpreted in terms of partially crystalline nano-sized structures giving rise to a marked freezing process below room temperature. © 1995 John wiley & Sons, Inc.
    Additional Material: 11 Ill.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 25 (1997), S. 522-528 
    ISSN: 0142-2421
    Keywords: Ta ; diffusion barriers ; nanocrystalline films ; amorphous films ; AFM ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: In this paper the investigation of r.f.-sputter-deposited Ta, Ta-N and Ta-N-O thin films is presented. Using atomic force microscopy in combination with sheet resistance measurements, Auger electron spectroscopy and x-ray diffraction, the thin film properties and microstructure are examined. Two crystalline modifications of Ta (tetragonal β-Ta and bcc α-Ta) are reported. By incorporation of nitrogen and/or oxygen into the Ta films, nanocrystalline and quasi-amorphous structures can be achieved. Finally, the usefulness of the films as diffusion barriers in Cu-based metallization systems is described.© 1997 John Wiley & Sons, Ltd.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
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