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  • Electronic Resource  (2)
  • Cascade arcs  (1)
  • Electron density  (1)
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 531-551 
    ISSN: 1572-8986
    Keywords: Cascade arcs ; flowing plasmas ; nonequilibrium
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The plasma in a cascaded arc in argon with flow is studied both experimentally and theoretically. The plasma pressure has been measured as a function of axial position in the are channel with a Baratron pressure transducer. The electron density and the electron temperature have been determined as a function of axial position using Hβ-Stark broadening and line-continuum emissivity ratio, respectively. Comparison of the gas pressure measurements with an equilibrium model suggests that the /low is laminar. A one-dimensional nonequilibrium model based on the electron- and heavy-particle number balances and the heavy-particle energy balance is presented. The measured axial profiles of the electron density agree well with the model predictions, especially in the most upstream part of the arc channel. The plasma is strongly ionizing. Temperature equilibration takes about 20 mm of arc length, depending on the argon flow.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1572-8986
    Keywords: Electron density ; microwave cavity ; fluorocarbon
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Electron densit ies have been determined /or RF plasmas that were generated within a microwave resonant cavity by measuring the difference of the resonance frequencies with and without plasma. Since that method only yields a value of the electron density weighted ouer the microwave electric field distribution, to obtain real values an assumption on the spatial distribution of the electron density had to he made. Spatial profiles were taken of the emission of a 4s–5p Ar line at 419.8 not (with a small Ar admixture). The electron densities have been determined as a function of pressure and RF power in Ar, CF4, C2 F6 and CHF, plasmas. The results indicate that the electron density for the last three gases decreases as a function of pressure above 50 m Torr. Typical values for the electron density for the investigated parameter range are 1–6 · 103 cm−3. Furthermore, the electron density is the lowest in gases with a high attachment cross .section.
    Type of Medium: Electronic Resource
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