Electronic Resource
Amsterdam
:
Elsevier
Microelectronic Engineering
8 (1988), S. 13-24
ISSN:
0167-9317
Keywords:
Microlithography
;
integrated circuit process technology
;
lens distortion
;
metrology
;
optical microlithography
;
overlay error
;
reduction error
;
step and repeat lithography
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
Type of Medium:
Electronic Resource
URL:
http://linkinghub.elsevier.com/retrieve/pii/0167-9317(88)90004-4
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