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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 9301-9304 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The photoluminescence bands in the visible and in the infrared of porous SiGe layers with initial Ge contents of 5% and 20%, prepared by anodical etching, are investigated at different temperatures. At room temperature the photoluminescence spectra are dominated by an intense red photoluminescence band centered at 1.8 eV. A weaker blue photoluminescence band is also observed which becomes more important at low temperatures. Raman measurements indicate only a low degree of confinement in our porous SiGe layers. The occurrence of blue–green luminescence seems to originate from the oxygen inclusions in the crystalline porous structure. Infrared photoluminescence spectroscopy on the porous layer shows that the broad infrared band known from porous Si is missing in the porous SiGe layers, but transitions via defects in the crystalline structure of the porous layers are observed. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 2411-2422 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A range of experimental techniques has been used to measure point defect concentrations in GaAs layers grown at low temperatures (250 °C) by molecular-beam epitaxy (LT-GaAs). The effects of doping on these concentrations has been investigated by studying samples containing shallow acceptors (Be) or shallow donors (Si) in concentrations of ∼1019 cm−3. Material grown under As-rich conditions and doped with Be was completely compensated and the simultaneous detection of As0Ga by near-band-edge infrared absorption and As+Ga by electron paramagnetic resonance confirmed that the Fermi level was near the midgap position and that compensation was partly related to AsGa defects. There was no evidence for the incorporation of VGa in this layer from positron annihilation measurements. For LT-GaAs grown under As-rich conditions and doped with Si, more than 80% of the donors were compensated and the detection of SiGa–VGa pairs by infrared localized vibrational mode (LVM) spectroscopy indicated that compensating VGa defects were at least partly responsible. The presence of vacancy defects was confirmed by positron annihilation measurements. Increasing the Si doping level suppressed the incorporation of AsGa. Exposure of the Be-doped layer to a radio-frequency hydrogen plasma, generated a LVM at 1997 cm−1 and it is proposed that this line is a stretch mode of a AsGa–H–VAs defect complex. For the Si-doped layer, two stretch modes at 1764 and 1773 cm−1 and a wag mode at 779 cm−1 relating to a H-defect complex were detected and we argue that the complex could be a passivated As antisite. The detection of characteristic hydrogen-native defect LVMs may provide a new method for the identification of intrinsic defects. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 85 (1999), S. 3661-3665 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The modification by postoxidation NO treatments of the Si/SiO2 interface in thermally grown Si(100)/SiO2 layers has been studied by nuclear reaction analysis and electron paramagnetic resonance spectroscopy. Our results demonstrate a selective incorporation of NO molecules at the Si/SiO2 interface and a drastic reduction in the interface defect density. In this new configuration, the Pb center density, which is typically 2×1012 cm−2 in the as oxidized samples, is reduced to below 1011 cm−2 without any hydrogen passivation. The thermal treatment in NO atmospheres opens the perspective for the formation of hydrogen free low defect Si(100)/SiOxNy interfaces conserving the qualities of the SiO2 dielectric. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 64 (1988), S. 65 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We describe information which has been obtained on point defects detected in various types of GaAs materials using electron paramagnetic resonance as well as electrical and optical techniques. From a comparison of their characteristics and those of simple intrinsic defects (As and Ga interstitials, vacancies and antisites) it is concluded that native defects are not simple intrinsic defects, with the exception of the antisites, but complexes formed by the interaction of such defects between themselves or with impurities. Particular emphasis is given to the As antisite complexed with an As interstitial, the so-called EL2 defect which plays a major role in the electrical properties of bulk materials. Differential thermal analysis, positron annihilation, and x-ray diffraction demonstrate that bulk materials contain a large concentration of vacancy-related defects and As precipitates located along dislocations which play the role of gettering centers. Presumably, bulk materials also contain other As clusters of various sizes although only the smallest ones (EL2) have been detected. All these As clusters are sources of As interstitials which play an important role in thermal treatments. As to semi-insulating materials, their electrical properties result mainly from the compensation between the double donor, called EL2, associated with the As antisite and the double acceptor ascribed to the Ga antisite.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 1041-1043 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The anion antisite AsGa formation in electron-irradiated GaAs of various compositions and dopings has been studied by electron paramagnetic resonance. The results are interpreted in a new model based on carrier recombination enhanced mobile arsenic interstitials exchanging sites with gallium-substituted impurities.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 7392-7396 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effect of thermal annealing of semi-insulating InP wafers in the 660–820 °C temperature range under SiNx capping condition is studied by electron paramagnetic resonance (EPR) spectroscopy. The annealing leads to the formation of electrically active, deep thermal donors with total defect concentrations up to 1016 cm−3. The thermal donors are of intrinsic origin. By transient EPR spectroscopy the activation energies for electron emission of the dominant thermal donors were determined to be 0.40 and 0.14 eV, respectively.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 67 (1990), S. 4385-4387 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The introduction rate of a hydrogen-related bistable electron trap, formed by a 150 °C plasma annealing, depends strongly on thermal preannealing. A pure thermal 850 °C preanneal completely anneals the native defects EL6 and EL3, reduces the native defect concentration EL2 by a factor of 10, and decreases equally the introduction rate of the bistable defect by a factor of 10. From a comparison between the profiles of these defects, it is possible to get informations on the microscopic structure of this hydrogen related defect as well as on the EL2 defect.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 62 (1987), S. 2738-2741 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Differential thermal analysis is applied to the measurement of defect total energies in GaAs. First, the technique is used to determine the energy liberated in the recombination of an As vacancy-interstitial pair; the result, in agreement with the theoretical estimate of the energy stored in such defect, allows the demonstration of the validity of the technique as well as its limitations. Then, the technique is used to evaluate the introduction rate of such defects by electron irradiation in a semi-insulating material in which electrical techniques cannot be applied. Finally, a characterization of native defects is attempted; it shows that recombination of native vacancies, with interstitials liberated when the movement of α dislocations takes place, occurs around 450 °C.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 57 (1990), S. 2464-2465 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Single wafers of Fe-doped semi-insulating InP have been annealed under Si3N4 capping in the 663–760 °C temperature range. Electron paramagnetic resonance (EPR) measurements performed on single crystals from different parts of the wafers show that the thermal annealing introduces various deep donor centers in concentration up to 1016 cm−3. The donor formation rate increases strongly for annealing temperatures higher than 700 °C. From EPR transient spectroscopy the thermal ionization energy of the dominant donor has been determined to Ec−0.34 eV. The results are correlated with previous electrical resistivity and photoluminescence measurements.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 56 (1990), S. 364-366 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We show that photorefractive beam coupling gain as a function of grating period measured in semi-insulating GaAs with an external ac electric field or with a dc field and moving fringes can be explained theoretically by a mobility-lifetime product about four orders of magnitude smaller than that obtained in low-field conditions. This reduction is caused by enhanced occupation of the L band at high fields coupled with the low L band mobility and by the increase in recombination due to the cascade capture process that occurs for electric fields above a few kV/cm.
    Type of Medium: Electronic Resource
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