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  • 1980-1984  (1)
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  • 1984  (1)
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  • 1980-1984  (1)
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    Electronic Resource
    Electronic Resource
    A new method of evaluation of the effect of electron beam and developing process on positive polymeric resists (1984)
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 29 (1984), S. 1427-1432 
    Details
    ISSN: 0021-8995
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: A new method of evalution of the effect of electron beam on the latent changes in degrading polymer resists has been developed on the base of measurement of the developing curve under an interference microscope. An evalution procedure using the unit parameters (film thickness and development time) has been suggested for the characterization of the sensitivity and contrast of resists.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/app.1984.070290435
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