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Excimer-laser doping into Si thin films (1990)

Sera, K. ; Okumura, F. ; Kaneko, S. ; [et al.]

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 67 (1990), S. 2359-2363

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: The fabrication of n+ and p+ silicon thin film by using a combination of "spin-on-glass'' and XeCl excimer-laser doping is described. The doping can be achieved by rapid dopant atom diffusion into molten silicon from a spin-coated film containing the dopant. This technology offers the advantages of process simplicity, low processing temperature, and ultrashallow high-concentration doping. The obtained sheet resistances (2 kΩ/(D'Alembertian) for n+ and 9 kΩ/(D'Alembertian) for p+) are acceptable for thin-film transistors (TFTs). The energy required for doping into a thin film was less than half of that for a silicon wafer. This is mainly due to the absorption rate difference between noncrystalline and crystalline silicon. This process appears extremely promising for TFT fabrication.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.345531

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Microelectrode array device: Photolithographic fabrication and electrochemical characterisation (1992)

Dobson, P. J. ; Jiang, L. ; Leigh, P. A. ; [et al.]

New York, NY [u.a.] : Wiley-Blackwell

Advanced Materials for Optics and Electronics 1 (1992), S. 133-138

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ISSN: 1057-9257

Keywords: Microelectrode array ; Photolithography ; Electrochemistry ; Chemistry ; Polymer and Materials Science

Source: Wiley InterScience Backfile Collection 1832-2000

Topics: Electrical Engineering, Measurement and Control Technology , Physics

Notes: A new type of microelectrode array device has been developed using semiconductor-processing techniques. An array of 15 × 15 square electrodes as small as 1 μm, spaced 100 μm apart, has been fabricated on a silicon chip of dimensions 1.5 × 1.5 mm2. Steady state electrochemistry was performed using these devices in both aqueous and non-aqueous media.

Additional Material: 4 Ill.