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  • 2000-2004
  • 1995-1999  (2)
  • 1995  (2)
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  • 2000-2004
  • 1995-1999  (2)
Year
  • 1
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 1232-1234 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We study the interplay of elastic and plastic strain relaxation of SiGe/Si(001). We show that the formation of crosshatch patterns is the result of a strain relaxation process that essentially consists of four subsequent stages: (i) elastic strain relaxation by surface ripple formation; (ii) nucleation of dislocations at the rim of the substrate followed by dislocation glide and deposition of a misfit dislocation at the interface; (iii) a locally enhanced growth rate at the strain relaxed surface above the misfit dislocations that results in ridge formation. These ridges then form a crosshatch pattern that relax strain elastically. (iv) Preferred nucleation and multiplication of dislocations in the troughs of the crosshatch pattern due to strain concentration. The preferred formation of dislocations again results in locally enhanced growth rates in the trough and thus leads to smoothing of the growth surface. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 66 (1995), S. 574-576 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Numerical finite element calculations have been reported to determine a correction function Φ that describes the reduction of the misfit that occurs when laterally limited structures such as faceted islands or mesa structures are grown on a substrate. The reduction of the average strain energy density is calculated in these three-dimensional islands and compared to the constant strain energy density in a continuous layer. Ratios Φ are obtained from the calculation of different island geometries, i.e., different facet angles γ and different aspect ratios island width l to island height h. These discrete values are fitted by a function which can easily be applied to the full range of aspect ratios (l/h(approximately-greater-than)0) and facet angles (0°〈γ〈90°). Faceted Ge(Si) islands on Si(001) substrate, grown from the solution in the Stranski–Krastanov growth mode, serve as an example for the calculation. Experimental and theoretical values for the critical thickness of these islands agree well. This result demonstrates the drastic influence of islanding on misfit strain distribution in island and substrate as well and, consequently, on the strong increase of the critical thickness as determined by the mechanical equilibrium theory of Matthews and Blakeslee. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
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