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Drilled alternating-layer three-dimensional photonic crystals having a full photonic band gap (2000)

Notomi, M. ; Tamamura, T.

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 77 (2000), S. 4256-4258

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: We propose a three-dimensional photonic crystal structure having a wide full photonic band gap in the optical regime, which can be fabricated by an alternating-layer deposition and etching (drilling) process. This fabrication process is much simpler than that previously reported. The combination of current lithographic technology and autocloning bias-sputtering deposition is a promising way of realizing these photonic crystals. © 2000 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.1332837

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