ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
MOCVD was applied to deposit TiO2 thin films on glass substrates. Effects of the depositionconditions (source temperature and substrate temperature) were studied. The phase and micro- structureof the TiO2 thin films were examined by X-ray diffraction and electron microscopy, respectively. Theresults indicate that substrate temperature affects both the morphology and the phase of the TiO2 film,while source temperature only affects the surface morphology of TiO2 film. Highly oriented anatase filmon glass substrate was obtained at a source temperature of 140 oC and a substrate temperature of 350 oC.XRD pattern shows that only the (200) peak of anatase appears under the conditions. The crystallines inthe highly oriented anatase were rectangular in top view
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/53/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.336-338.1976.pdf
Permalink
