ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The energy relaxation rate for hot electrons in n-type GaN epilayers has been measured over the temperature range 1.5–300 K. Several samples grown by molecular-beam epitaxy and having different electron concentrations have been studied. At low electron temperatures (Te〈20 K), the energy relaxation is via acoustic phonon emission. The magnitude and temperature dependence of the energy relaxation are found to be in good agreement with theoretical calculations using appropriate values of the deformation potential and piezoelectric coupling constants and ignoring screening. For Te≥70 K, the dominant mechanism of energy loss is optic phonon emission. For the several samples studied, consistent values of the optic phonon energy and electron-optic phonon relaxation time, 90±4 meV and 5–10 fs, respectively, are measured. The energy agrees well with values obtained by other methods and the relaxation time is consistent with theoretical calculations of the Fröhlich interaction and indicate that hot phonon effects are absent up to 10−8 W/electron dissipation. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1334642
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