Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
90 (2001), S. 3610-3613
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The nucleation and growth of Cu nanoparticles during the initial stage of film growth by chemical vapor deposition was investigated using transmission electron microscopy and energy dispersive x-ray spectroscopy analysis. Cu nanoparticles did not migrate on the SiO2 surface because the Cu nanoparticles were deposited by autocatalytic reactions onto pre-existing nuclei, and therefore were strongly bonded to the surface. The initial growth mechanism of Cu nanoparticles appears to be that Cu particles deposit by surface reaction onto pre-existing nuclei, grow to become nanoparticles, and these nanoparticles form amorphous Cu islands. The amorphous Cu islands grow to become larger islands that consist of partially-crystallized Cu. The crystallized Cu particles then begin to form on the amorphous Cu phases. With increasing deposition time, the amorphous Cu phases completely convert into crystalline phases to form a crystalline film. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1385359
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