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  • 1995-1999  (2)
  • 1990-1994  (1)
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  • 1
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Several series of epitaxial films of nominal pure and bismuth-, aluminum-substituted yttrium iron garnet are grown on [111]-oriented paramagnetic substrates from PbO-fluxed melts. The growth rate is varied systematically by changing the supercooling. The optical absorption at a wavelength of 1330 nm and the concentrations of the impurities Pb2+, Pb4+, Pt4+, Si4+, and Ca2+ are measured. The absorption shows a minimum at a certain growth rate vmin, which increases linearly with the saturation temperature of the melt. The minimum of the absorption constant reaches values below 0.3 cm−1. The as-grown films contain a surplus of four-valent impurities, the minimum concentration of which correlates with the minimum of the optical absorption. The absorption of samples with growth rates higher than vmin can be reduced considerably by annealing in hydrogen atmosphere at 430 °C for a few minutes.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Fresenius' Zeitschrift für analytische Chemie 353 (1995), S. 389-392 
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract Electron probe microanalysis (EPMA) at low electron energies (typically 3–10 keV) has been used to study the composition of coatings with a film thickness of 0.1–1.3 μm (“bulk” analysis). The accuracy of quantification, including the most critical situation of low atomic number elements (boron–oxygen), is about 5% relative by use of pure element or arbitrary compound standards. A special procedure of data processing (“thin film” analysis) enables the simultaneous determination of film thickness and composition, provided that the substrate is known. The film thickness may be in the range of 2 nm to 5 μm. EPMA can be also applied in the mode of “non-destructive in-depth analysis”, which is based on the combined evaluation of experiments at different electron energies. The quantitative characterization of layered structures and implantation zones is demonstrated.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Fresenius' Zeitschrift für analytische Chemie 353 (1995), S. 389-392 
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract Electron probe microanalysis (EPMA) at low electron energies (typically 3–10 keV) has been used to study the composition of coatings with a film thickness of 0.1–1.3 μm (“bulk” analysis). The accuracy of quantification, including the most critical situation of low atomic number elements (boron-oxygen), is about 5% relative by use of pure element or arbitrary compound standards. A special procedure of data processing (“thin film” analysis) enables the simultaneous determination of film thickness and composition, provided that the substrate is known. The film thickness may be in the range of 2 nm to 5 μm. EPMA can be also applied in the mode of “non-destructive in-depth analysis”, which is based on the combined evaluation of experiments at different electron energies. The quantitative characterization of layered structures and implantation zones is demonstrated.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
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