Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
68 (1990), S. 1378-1380
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Gas evolution experiments have been performed on hydrogenated amorphous carbon (a-C:H) films prepared by plasma deposition. Two series of films are studied: in series I, C2H2 is used as a process gas at a fixed bias voltage while the gas pressure is varied, and in series II, CH4 is employed at a fixed gas pressure, and the bias voltage is changed. The results are compared to infrared absorption data and density measurements and support the presence of a void network in the amorphous material, the extent of the void network depending on the deposition conditions.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.346690
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