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  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Journal of clinical monitoring and computing 10 (1993), S. 101-107 
    ISSN: 1573-2614
    Keywords: noninvasive sensor ; respiratory rate ; patient monitoring ; acoustic air flow sensor ; patient recovery
    Source: Springer Online Journal Archives 1860-2000
    Topics: Computer Science , Medicine
    Notes: Abstract The need for continous, noninvasive, and reliable respiratory rate monitoring during recovery from general anesthesia has long been recognized. Alternative principles can be grouped into those detecting the respiratory effort, and those detecting the actual result, i.e. the respiratory gas flow. The second category is of greatest interest for patient monitoring. In this paper, we report the development and initial clinical experience with a new acoustic air-flow sensor. By differential, multipoint detection of the air-flow in the mouth and nose region, the sensor can easily discriminate against different kinds of interference, including motion arterfacts. The sensor is nonexpensive, rugged, simple to apply, and inherently safe. An instrument with continous display of respiratory rate, and an audiovisual apnea alarm has been designed and built. The complete system has been tested on patients during recovery after general anesthesia. In 16 patients, the respiratory rate displayed by the instrument has been correlated against that visually observed. A good correlation was obtained. Minor discrepancies can be explained from the fact that visual observation corresponds to the respiratory effort, whereas the sensor detects the actual air flow. In 12 patients, 24 hour simultaneous recordings were made of respiratory rate with the new sensor, with simultaneous recording of the oxygen saturation and the heart rate with a pulse oximeter. It was found that the new sensor reliabley recorded respiratory depression and apnea. Such events may in some patients be as frequent as one incident per hour. One case of ‘Ondine's curse’ provided clear evidence that pulse oximetry has a low sensitivity to respiratory disorders.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 20 (1993), S. 1051-1054 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: The dependence of depth resolution Δz/z on the sputtering angle θ is investigated for three sputter-deposited films: Cr (bee), SiNx (amorphous) and FeCoTb (amorphous). The depth resolution for the Cr system exhibits two maxima at θ = 35° and 45°. These are characteristic for bee textured material but different from fee textured material. The amorphous films show a very weak dependence, if any, owing to the absence of crystallites and crystalline texture. These results are in accordance with channeling theory.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 19 (1992), S. 55-59 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: In an NiFe/Ta system, interface widths (Δz) are compared for sputter profiles with stationary and rotating sample holder (Zalar rotation). For low sputter angles, the Zalar rotation brings considerable improvements in Δz. For higher sputter angles, the improvement available through Zalar rotation vanishes as self-shadowing due to crystallites with less favorable orientation becomes the dominating rate mechanism. The improvement is further reduced for thinner films much below 1000 Å. For low sputter energies and films 125 Å thick, Zalar rotation has no influence. The limit of depth resolution was 30 Å, which resulted from the substrate-induced roughness of the NiFe/Ta interface. The interface width's maximum near 30° for stationary sputter etching is characteristic of sputter-deposited fcc films.
    Additional Material: 9 Ill.
    Type of Medium: Electronic Resource
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