ISSN:
0142-2421
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
The parameters controlling reactively deposited aluminium oxide films on Au and polycarbonate substrates have been investigated under typical PVD conditions of varying O2 flux and deposition rate of thicknesses up to 150 nm. Chemical and physical characterization have been carried out by the use of x-ray photoelectron spectroscopy (XPS) combined either with sputter profiling or by variation of the emission angle (ARXPS), electron probe microanalysis (EPMA), atomic force microscopy (AFM) and by transmission electron microscopy (TEM). Correlation between XPS, EPMA, AFM and TEM points to island formation during co-deposition of crystalline metallic Al and amorphous oxide areas if the O2 flux is insufficient. For high O2 fluxes, completely amorphous Al2O3 films are found. No intermediate phase between Al metal and Al2O3 was detected.
Additional Material:
9 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/sia.740210806
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