Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
58 (1991), S. 2438-2440
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have developed a two-step anisotropic etching process to fabricate thin silicon membranes, used to study supercurrent transport in semiconductor coupled weak links. The process uses a shallow BF+2 implantation, and permits easy control of membrane thickness ≤100 nm. Preliminary measurements on membrane-based Nb-Si-Nb junctions reveal the simultaneous occurrence of tunnel behavior and Josephson coupling.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.104866
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