Digitale Medien
College Park, Md.
:
American Institute of Physics (AIP)
The Journal of Chemical Physics
90 (1989), S. 2834-2835
ISSN:
1089-7690
Quelle:
AIP Digital Archive
Thema:
Physik
,
Chemie und Pharmazie
Notizen:
Emission spectra of SiF3 radical were observed from photodissociative excitation of SiF4 at 99.1, 95.5, and 92.3 nm. The spectra show a broad visible band in the 350–800 nm region, a UV band in 290–340 nm, and a weak band in 240–280 nm. The visible band resembles the chemiluminescence spectra observed from etching of silicon by F or XeF2.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1063/1.455935
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