ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
A lithographic process is described which increases the sensitivity of polymers to electron beam irradiation. The free radicals and peroxides produced in a film of polymer by irradiation are used to initiate the grafting of a monomer to form a graft copolymer, the solubility of which may be higher or lower than that of the initial polymer. Acrylic acid has been grafted into poly(methyl methacrylate) films to produce a copolymer which is insoluble in the solvents of PMMA. The sensitivity of this negative system depends on the conditions of grafting and on the conditions of development. A sensitivity of 2.8 10-8 C.cm-2 at 20 keV has been obtained.
Additional Material:
4 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760201606
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