ISSN:
1572-8986
Schlagwort(e):
RF plasma
;
plasma polymerization
;
modeling
;
theoretical
Quelle:
Springer Online Journal Archives 1860-2000
Thema:
Chemie und Pharmazie
,
Maschinenbau
,
Technik allgemein
Notizen:
Abstract A theoretical model has been developed to describe the deposition of polymer occurring in a capacitatively coupled, low-pressure, RF discharge sustained in ethane. The reaction mechanism chosen for this model assumes that polymer formation is controlled by the formation of free radicals in the plasma and the subsequent reaction of these species at the surface of the electrodes used to sustain the plasma. Convective and diffusive transport is taken to occur in the direction parallel to the electrodes. Diffusive transport perpendicular to the electrodes is considered to be rapid, and hence the gradients in this direction are taken to be negligible. Both the composition of the gas leaving the plasma reactor and the axial profile of polymer deposition rate within the reactor, observed experimentally, are predicted accurately by the model. Results obtained from the model have also been used to estimate the kinetic chain length and degree of unsaturation in the polymer. Both predictions are found to be in reasonable agreement with experimental observations.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1007/BF00566019
Permalink
