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  • 1
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Macromolecules 14 (1981), S. 118-124 
    ISSN: 1520-5835
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 3 (1983), S. 139-161 
    ISSN: 1572-8986
    Keywords: RF plasma ; plasma polymerization ; gas chromatrography ; experimental
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The plasma polymerization of ethane was studied in a flow reactor of rectangular cross section. The plasma was sustained between parallel-plate electrodes by an RF generator operating at 13.56 MHz. The composition of the gas leaving the reactor was analyzed by gas chromatography. Polymer deposition rates were measured as a function of axial position in the reactor, using a quartz-crystal microbalance. The effluent gas is composed primarily of unreacted C2H6 and H2. Significant concentrations of CH4, C2H4, C2H2, and C3H8, and small amounts of C3H6, i-C5H12, and n-C5H12, are also observed. The distribution of these products is a strong function of the discharge power and of the gas pressure and residence time in the plasma. These experimental variables also affect both the rate of polymer deposition and the shape of the deposition profile along the reactor axis.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 3 (1983), S. 163-192 
    ISSN: 1572-8986
    Keywords: RF plasma ; plasma polymerization ; modeling ; theoretical
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A theoretical model has been developed to describe the deposition of polymer occurring in a capacitatively coupled, low-pressure, RF discharge sustained in ethane. The reaction mechanism chosen for this model assumes that polymer formation is controlled by the formation of free radicals in the plasma and the subsequent reaction of these species at the surface of the electrodes used to sustain the plasma. Convective and diffusive transport is taken to occur in the direction parallel to the electrodes. Diffusive transport perpendicular to the electrodes is considered to be rapid, and hence the gradients in this direction are taken to be negligible. Both the composition of the gas leaving the plasma reactor and the axial profile of polymer deposition rate within the reactor, observed experimentally, are predicted accurately by the model. Results obtained from the model have also been used to estimate the kinetic chain length and degree of unsaturation in the polymer. Both predictions are found to be in reasonable agreement with experimental observations.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 21 (1981), S. 643-649 
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: A study was made of the effects of hydrogen containing additives on the polymerization of tetrafluoroethylene in a radiofrequency low pressure plasma. The addition of ethylene and molecular hydrogen were found, under certain circumstances, to significantly increase the rate of polymer deposition. This effect is ascribed to the release of hydrogen atoms from the additive, which enhance the formation of fluorocarbon-free radicals and scavenges fluorine atoms. ESCA (electron spectroscopy for chemical analysis) spectra of the deposited films show that upon addition of hydrogen to the monomer, the F/C ratio of the film decreases and the H/C ratio rises. Hydrogen addition also influences the extent of crosslinking - a decrease being observed at low discharge power and an increase being observed at high discharge power.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
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