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  • 1975-1979  (1)
  • high-purity aluminum thin films  (1)
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  • 1975-1979  (1)
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    Electronic Resource
    Electronic Resource
    Springer
    Oxidation of metals 13 (1979), S. 245-254 
    ISSN: 1573-4889
    Keywords: high-purity aluminum thin films ; in situ electron microscopy ; in situ evaporation ; in situ oxidation
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract The authors studied the oxidation of thin aluminum films free of oxide layers in situ prepared by evaporation directly in the electron microscope under ultra-high-vacuum conditions. The oxidation was realized at various temperatures (350–500°C) and at various oxygen pressures (1–10−3 Pa). The formation and growth of the amorphous and crystalline products have been studied.
    Type of Medium: Electronic Resource
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