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Direct high-resolution excimer laser photoetching (1984)

Rice, S. ; Jain, K.

Springer

Applied physics 33 (1984), S. 195-198

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ISSN: 1432-0630

Keywords: 32

Source: Springer Online Journal Archives 1860-2000

Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics

Notes: Abstract Direct high-resolution photoetching of various resists and polymers has been demonstrated using an ArF excimer laser at 193 nm. Features as small as 0.3 μm have been produced in 1 μm thick films with no subsequent wet processing steps necessary.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1007/BF00618755

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