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  • 78.55.Cr  (1)
  • 85.30D  (1)
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  • 1
    ISSN: 1432-0630
    Keywords: 78.47.+p ; 78.55.Cr ; 78.45.+h
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The dependence of the bandstructure and the resulting dependences of the intensity and the wavelength of stimulated emission on the carrier density are demonstrated in optically excited Al x Ga1−x As near the crossover composition x c at room temperature. Density induced Γ to L and Γ to X crossings, based on the large band-gap renormalization near the crossover composition, are observed in samples with an AlAs mole fraction x=0.43 and x=0.46. The band crossings are indicated by strong fluctuations of the intensity and the wavelength of stimulated emission. This behavior is quantitatively well explained by using a multi-valley model for the description of the band-gap renormalization. The multi-valley model leads to an exact density-dependent prediction of the wavelength and to an estimation of the intensity of stimulated emission in indirect band-gap Al x Ga1−x As and shows the optimum AlAs mole fraction for semiconductor laser application.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1432-0630
    Keywords: 68.55 ; 73.40T ; 85.30D
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract We describe the first MOS transistors fabricated in silicon-on-insulator layers, obtained by liquid phase epitaxial lateral overgrowth of Si over SiO2. Growth is performed around 930°–920° C using indium as a solvent. The layers are therefore p-type and have a doping of 4·1016 cm−3. Electron mobilities of 540 cm2/Vs are obtained in the inversion channel; the threshold voltage of transistors with a gate length of 14.1 μm is 510 mV. Our data demonstrate the applicability of liquid-phase epitaxial Si grown over oxidized Si for future use in three-dimensional integrated-device processing.
    Type of Medium: Electronic Resource
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