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  • C atom density determination  (1)
  • flowing post-discharge  (1)
  • gas temperature determination  (1)
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Plasma chemistry and plasma processing 15 (1995), S. 221-230 
    ISSN: 1572-8986
    Keywords: C atom density determination ; gas temperature determination ; flowing post-discharge
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Nitrogen, oxygen, and carbon atoms have been detected by optical emission spectroscopy in a common flowing post-discharge of an Ar-x CH4 rf plasma torch and an Ar-2%N2 microwave discharge. Gas temperature as determined from CN and N2 rotational svstems is 3200 ± 200 K in the rf torch and 700 ± 100 K in the post-discharge at a time 3 X10−2 s after the rf plasma torch. From the intensities of the N2 1st positive system, of NO, and of CN violet hands, the atom densities have been determined as 2 X 1016 cm3 for N, 1015 cm3 for O, and 6 X 1012 cm3 for C in the post-discharge at p=650 torr, with 103 of CH4 in the Ar torch.
    Type of Medium: Electronic Resource
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