ZIB

Treffer pro Seite

Treffer 1 - 1 | 1 Treffer

Sortierung

Digitale Medien

Determination of C-atom density downstream an Ar-CH4 rf plasma torch (1995)

Cavadias, S. ; Amouroux, J. ; Hochard, L. ; [weitere]

Springer

Plasma chemistry and plasma processing 15 (1995), S. 221-230

zur Merkliste hinzufügen auf der Merkliste

Details

ISSN: 1572-8986

Schlagwort(e): C atom density determination ; gas temperature determination ; flowing post-discharge

Quelle: Springer Online Journal Archives 1860-2000

Thema: Chemie und Pharmazie , Maschinenbau , Technik allgemein

Notizen: Abstract Nitrogen, oxygen, and carbon atoms have been detected by optical emission spectroscopy in a common flowing post-discharge of an Ar-x CH4 rf plasma torch and an Ar-2%N2 microwave discharge. Gas temperature as determined from CN and N2 rotational svstems is 3200 ± 200 K in the rf torch and 700 ± 100 K in the post-discharge at a time 3 X10−2 s after the rf plasma torch. From the intensities of the N2 1st positive system, of NO, and of CN violet hands, the atom densities have been determined as 2 X 1016 cm3 for N, 1015 cm3 for O, and 6 X 1012 cm3 for C in the post-discharge at p=650 torr, with 103 of CH4 in the Ar torch.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1007/BF01459697

Permalink

Bibliothek	Standort	Signatur	Band/Heft/Jahr	Verfügbarkeit

Andere fanden auch interessant ...

Artikel (Nationallizenzen)

Volltext

Treffer 1 - 1 | 1 Treffer