Electronic Resource
Amsterdam
:
Elsevier
International Journal of Radiation Applications & Instrumentation. Part D,
12 (1986), S. 241-244
ISSN:
1359-0189
Keywords:
CR-39
;
Chemical etching
;
ZnP-Glass
;
computation of track lengths
;
critical stopping-power
;
heavy ions
;
maximum etchable track length
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
,
Physics
Type of Medium:
Electronic Resource
URL:
http://linkinghub.elsevier.com/retrieve/pii/1359-0189(86)90579-0
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