ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
UV spectroscopy, gel permeation chromatography (GPC) and liquid chromatography (LC) have been used to analyze process factors that influence the properties of PDXR-2 plasma developed X-ray resist comprised of 92.5 wt percent poly(2,3-dichloro-1-propyl acrylate) and 7.5 wt percent bis-acryloxybutyltetramethyldisiloxane (BABTDS). The GPC-LC method is particularly useful in optimizing fixing conditions, determining monomer concentration in the film, and studying molecular processes caused by absorbed X-rays and thermal effects during fixing. Evidence for a synergistic sensitivity enhancement resulting from fixing and exposure is presented. Optimally processed O2 reactive-ion etch developed patterns exhibit a microgranular texture in both exposed and unexposed regions of 〈500 Å size. Unexposed region texture consists of SiO2 resulting from the BABTDS monomer. It is completely removed by reactive ion etching with CHF3 for short times at low power. The exposed area texture is not removed and affords an edge roughness per line edge of 〈500 Å. Resolution appears mask limited while granular size is dependent on exposure time. A 20 sec exposure optimizes resolution, pattern uniformity, and granularity. 0.5 μm line and space resolution can be obtained with the X-ray machine and masks currently in use.
Additional Material:
18 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760231811
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