ISSN:
1057-9257
Keywords:
chemical vapour deposition (CVD)
;
silica
;
silicate gasses
;
SiO2
;
MOS devices
;
precursors
;
hydrides
;
halides
;
metal organic compounds
;
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Electrical Engineering, Measurement and Control Technology
,
Physics
Notes:
An overview is presented of the chemical vapour deposition (CVD) of SiO2 and related materials, together with a description of their application in metal-oxide-semiconductor (MOS) devices, including device isolation, gate insulation passivation and planarisation. A comparison of CVD methods and precursors is presented for SiO2 as well as doped glasses, e.g. borosilicate glasses (BSG), phosphosilicate glasses (PSG), borophosphosilicate glasses (BPSG), and arsenosilicates glasses (AsSG).
Additional Material:
7 Ill.
Type of Medium:
Electronic Resource
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