Electronic Resource
Amsterdam
:
Elsevier
Microelectronic Engineering
7 (1987), S. 41-60
ISSN:
0167-9317
Keywords:
Electron beam
;
GaAs
;
X-ray mask
;
charging
;
critical dimensions
;
defect detection
;
displacement
;
inspection
;
integrated optics
;
linewidth
;
low voltage
;
mask
;
measurement
;
microelectronics
;
pitch
;
placement
;
scanning electron microscope
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
Type of Medium:
Electronic Resource
URL:
http://linkinghub.elsevier.com/retrieve/pii/0167-9317(87)90005-0
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