Electronic Resource
Amsterdam
:
Elsevier
Microelectronic Engineering
2 (1984), S. 281-298
ISSN:
0167-9317
Keywords:
Ag/Se-Ge
;
LSI processing
;
inorganic resist technology
;
submicron photolithography
Source:
Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
Topics:
Electrical Engineering, Measurement and Control Technology
Type of Medium:
Electronic Resource
URL:
http://linkinghub.elsevier.com/retrieve/pii/0167-9317(84)90006-6
Permalink
Library |
Location |
Call Number |
Volume/Issue/Year |
Availability |