ISSN:
1432-0630
Schlagwort(e):
PACS: 42.62; 81.40; 81.65
Quelle:
Springer Online Journal Archives 1860-2000
Thema:
Maschinenbau
,
Physik
Notizen:
Abstract. We fabricated a well-defined pattern of lines and spaces on the surface of a quartz crystal plate (c-SiO2) with micron-sized features, using laser-induced backside wet etching (LIBWE). The line patterns obtained using LIBWE showed a high aspect ratio of about 3. The etch rates of fused silica (a-SiO2) ranged from 5 to 25 nm/pulse with KrF laser irradiation from 0.4–1.3 J/cm2. Threshold fluences for a-SiO2 and c-SiO2 were 0.23 and 0.34 J/cm2, respectively. The single-pulse etch depth was not affected by the repetition rates of laser pulses from 1–50 Hz.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1007/s003390051398
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