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  • 1
    Electronic Resource
    Electronic Resource
    Gas-dynamic consideration of the laser evaporation synthesis of single-wall carbon nanotubes (1999)
    Springer
    Applied physics 69 (1999), S. S593 
    Details
    ISSN: 1432-0630
    Keywords: PACS: 81.05.Tp; 81.10.Jt
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract. The abundance of carbon single-wall nanotubes (SWNTs) in soot synthesized by pulsed laser evaporation of graphite is studied over a wide range of synthesis conditions. The derived SWNT growth time-scale appears to be much longer than any characteristic time-scale in a simplified model of the relaxation of a high-pressure hot condensing gas bubble in a background atmosphere. It is concluded that SWNT nucleation and growth take place in relaxed, condensed, thermalized evaporation products at an optimal temperature between 850–1250 °C at a rate of few μm length per second, which is consistent with a condensed state “precipitation” mechanism for the SWNT formation.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s003390051483
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    A modified plasma source for controlled layer thickness synthesis in laser pulse vapour deposition (LPVD) (1993)
    New York, NY [u.a.] : Wiley-Blackwell
    Advanced Materials for Optics and Electronics 2 (1993), S. 19-29 
    Details
    ISSN: 1057-9257
    Keywords: Thin films ; Laser ablation ; X-ray mirrors ; Plasma sources ; UHV deposition equipment ; Ni/C multilayer structures ; SNMS depth profiling ; TEM cross-section ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: The conventional thin film deposition equipment of LPVD has been modified for the preparation of nanometre-layer stacks of uniform thickness at reduced target/substrate separation. Therefore the planar target was replaced by a cylindrical one and the target motion regime has been modified.During thin film deposition a substrate translation is preferred instead of the usual rotation technique. With this arrangement the emission characteristic of the plasma source can be computer controlled and tailored via a stepper-motor-driven manipulator for the desired layer thickness profile across an extended substrate. Thus, for example, a homogeneous film thickness is obtained even for lower target/substrate distances, and an appropriate deposition rate can be maintained.First applications of the equipment are explained and compared with typical results of the conventional technique.
    Additional Material: 11 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/amo.860020104
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    Paper (German National Licenses)
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