ISSN:
0142-2421
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
Concentrations of carbon in layer of metal organic vapour phase epitaxy (MOVPE)-grown AIAs on GaAs substrates were determined by SIMS using a Cs+ primary ion beam. The measurements demonstrate that by using an ultrahigh vacuum (UHV)VG quadrupole-based SIMS instrument and thorough outgassing of samples, sputter etching conditions can be established that give C- signals unaffected by residual gas interference, while maintaining good depth resolution.
Additional Material:
2 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/sia.740171110
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