ISSN:
1572-8986
Keywords:
Titanium nitride
;
glow discharge plasma CVD
;
TiCl4 wear protective coatings
;
diffusion barriers
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Technology
Notes:
Abstract Titanium nitride thin films have been deposited from TiCl4, N2, and H2, in a low-pressure glow discharge at temperatures of ≤500°C, which are compatible with most applications. Based on our earlier work on the effect of tire plasma parameters on the chemical pseudoequilibrium in this and in similar systems, the chlorine content could he reduced to less than 2 at %. Suppression of the positive column reduced the gas-phase reaction within the reactor volume and the concomitant homogenous nucleation Dense, vent hard films with golden color could he deposited on various substrates including silicon and steel.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01447150
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