Library

X
feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Electronic Resource
    Electronic Resource
    Decomposition of CCl4 in an RF discharge—A gas chromatography and time-resolved emission spectroscopy study (1981)
    Springer
    Plasma chemistry and plasma processing 1 (1981), S. 247-260 
    Details
    ISSN: 1572-8986
    Keywords: Plasma chemistry ; plasma etching ; spectroscopy
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The decomposition of CCl4 in an rf discharge starts by a very fast electron attachment mechanism $$\begin{gathered} CCl_4 \xrightarrow{{ + e}}(CCl_4^ - ) \to CCl_3 + Cl^ - \hfill \\ \hfill \\ k_0 \hfill \\ \end{gathered}$$ A first-order rate constant, (k0 · ne) ≈ 10+2−10+3 s−1, is estimated by two-channel time-resolved emission spectroscopy. The ability of the method to detect the change of concentrations in plasma processes is discussed. A steady-state product distribution containing CCl4, C2Cl4, C2Cl6, Cl2, and glow polymer as main products is formed via recombination processes. The influence of plasma power density on this product distribution is given by gas-chromatographic results.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00568833
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 2
    Electronic Resource
    Electronic Resource
    Plasma-chemical reactions in weakly decomposed CCl4 (1985)
    Springer
    Plasma chemistry and plasma processing 5 (1985), S. 293-316 
    Details
    ISSN: 1572-8986
    Keywords: Plasma chemistry ; halocarbon decomposition ; kinetics
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract For the case of weak feed gas decomposition, where the concentration of CCl4 exceeds those of decomposition and built-up products, the emission of CCl* is shown to originate from dissociative excitation of CCl4. With electron concentration measured independently, the kinetics of CCl4 decomposition has been extracted from the time dependence of the CCl* intensity. Supported by EPR determinations of radical concentrations in rapidly flowing CCl4 and CCl4/O2 afterglows, the primary decomposition reaction is shown to be the electron impact dissociation into CCl3 and Cl. Its rate constant (k 1=4×10−8 cm3s−1) indicates strongly that dissociative electron attachment is the main reaction channel at least at r.f. power densities just above the threshold of a self-maintaining discharge. At extremely low mean electron energies the emission of a continuum is observed, which is tentatively ascribed to the radiative CCl3-Cl recombination.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00566006
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...