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Digitale Medien

X rays in electron-cyclotron-resonance processing plasmas (1992)

Castagna, T. J. ; Shohet, J. L. ; Denton, D. D. ; [weitere]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 60 (1992), S. 2856-2858

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ISSN: 1077-3118

Quelle: AIP Digital Archive

Thema: Physik

Notizen: Electron-cyclotron-resonance processing plasmas have been shown to produce low-energy x rays. X radiation was detected in nitrogen and CF4 plasmas from energies of 1–17 keV for microwave powers up to 1000 W. The x-ray flux decreased with increasing pressure over the range of 0.5–3.5 mTorr. Temperatures of the hot electrons responsible for creating the x rays were estimated from the slopes of the x-ray spectra and decreased with increasing pressure. The measured x-ray flux decreased substantially when the magnetic field configuration was changed. Measurable x radiation is produced whenever a field line that passes through the cyclotron resonance surface intersects the vacuum chamber walls and/or other solid surfaces inside the source chamber.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1063/1.106846

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2

Digitale Medien

Effects of deposition parameters on the refractive index in plasma polymerized methyl methacrylate thin films (1992)

Tobin, J. A. ; Denton, D. D.

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 60 (1992), S. 2595-2597

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ISSN: 1077-3118

Quelle: AIP Digital Archive

Thema: Physik

Notizen: Plasma polymerization can be used to deposit thin films whose properties significantly differ from those of conventionally synthesized linear or cross-linked polymers. We investigate the plasma polymerization of methyl methacrylate for use in microelectronic and photonic applications. The deposition system is a 13.56 MHz parallel plate reactor. The effects of varying rf power and neutral pressure on deposition rate and refractive index in the visible are examined. It is found that the deposition rate can be varied from 50–500 A(ring)/min over a pressure range of 40–300 mT. In addition, the refractive index can be varied from 1.5 to 1.6 in the visible by varying the rf power from 10 to 50 W. Possible applications in photonics include smoothly varying graded index and multilayer structures.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1063/1.106920

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3

Digitale Medien

Use of photosensitive polyimide for deep x-ray lithography (1995)

White, V. ; Ghodssi, R. ; Herdey, C. ; [weitere]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 66 (1995), S. 2072-2073

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ISSN: 1077-3118

Quelle: AIP Digital Archive

Thema: Physik

Notizen: In this letter, a method is outlined and results presented for an x-ray lithography micromachining process that offers a greatly improved sensitivity over the LIGA process. This process is based on photosensitive polyimide (PPI), which is a commercial photoresist typically used as a passivation layer or dielectric material in the semiconductor industry. The main benefit of this process is its high sensitivity, which is approximately two orders of magnitude greater than that of the PMMA used in the LIGA process. Using a synchrotron radiation x-ray source, we have achieved resist patterns over 1000 μm thick. The capability has also been demonstrated for aspect ratios over 10, as well as the ability to print linewidths down to 0.5 μm. © 1995 American Institute of Physics.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1063/1.113906

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