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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 923-927 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Plasma immersion ion implantation is a surface modification technique in which ions to be implanted are drawn directly from surrounding plasma by a pulse biased substrate. Ion acceleration occurs in the electric sheath that forms around the substrate. The technique is most often used to implant ions, such as nitrogen, from plasmas formed by excitation of a gas. More recently it has been applied with cathodic vacuum arc plasmas in order to implant metal ions. These plasmas have a directed ion drift velocity and generally a higher density than gas based plasmas. Both of these differences influence the development of the electric sheath, which determines the implantation profile and the overall stability of the process. If the sheath expands too much during the pulse, the plasma is depleted and implantation ceases. If, however, the sheath is too thin at any point in space breakdown occurs also stopping the implantation process. The major parameters affecting the sheath formation are plasma density, ion drift velocity, and substrate curvature. The influence of each of these factors is discussed and strategies for forming optimum sheath structures are identified. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 230-236 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The Gibbs free energy as generalized by J. F. Nye [Physical Properties of Crystals (Clarendon Press, Oxford, 1957), p. 179] is minimized in thermodynamic systems held at constant temperature and constant stress. This function is orientation dependent in all crystal systems in stress fields which are not purely hydrostatic. There are situations in which preferred orientation arises as a result of the synthesis of materials under impressed stress conditions such as thin film growth under ion bombardment and the pressing of powders into solids. Here, we derive the orientational constraints for cubic crystals which result from growth under a general biaxial stress field. The sign of the expression δ=s11−s12−〈fraction SHAPE="CASE"〉12s44 determines the behavior of a cubic crystal. Electron diffraction patterns of face-centered-cubic specimens with both positive and negative values of δ are calculated using a program in MATLAB and displayed in a form suitable for direct comparison with experiment. The use of a biaxial stress with unequal principal components for producing highly oriented polycrystalline material is discussed. In the case of δ positive, as occurs in silicon, the preferred orientation is simply an alignment of the 〈100〉 directions along the principal stresses. For δ negative, as occurs in titanium nitride, the preferred orientation depends on the ratio of the principal stresses and low index directions are aligned with the principal stresses only when the principal stresses are either equal or one of them is zero. In the general case, arc-like diffraction patterns are produced. The results of a calculation of a diffraction pattern from a cross-sectional TiN film are compared with diffraction patterns reported by L. Hultman et al. [J. Appl. Phys. 78, 5395 (1995)] and show good agreement. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 87 (2000), S. 4198-4204 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: When plasma immersion ion implantation is performed in the condensable plasma stream produced by a cathodic vacuum arc, deposition as well as implantation usually occurs. In this article we describe a method of achieving pure implantation by orienting the substrate so that it is shadowed from the plasma beam. Implantation depth profiles measured in glassy carbon and CR39 polymer using Rutherford backscattering are compared to illustrate the effectiveness of the technique for conducting and insulating substrates. Charging of the insulating substrate was found to cause a reduction in implantation depth compared to a conducting substrate. The depth profiles in glassy carbon were comparable to those achieved by conventional extracted ion beam implantation. Implantation of magnesium into hydroxyapatite and alumina was carried out to improve the bone cell adhesion onto these materials for prosthetic applications. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 71 (2000), S. 3373-3376 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Magnetic multipole plasma confinement geometries employing permanent magnets are commonly used to confine laboratory plasmas and improve uniformity. Here we describe the design and operation of a particularly simple and low-cost kind of current-driven multipole system that makes use of a similar magnetic field structure but does not require permanent magnets. The magnetic field is generated by current carrying wires attached to the inside wall of a cylindrical supporting structure to provide a magnetic field resembling that of permanent multipole magnetic homogenizers. We demonstrate the use of the current-driven homogenizer to improve the uniformity of the radial density profile of a vacuum arc generated metal plasma. Our configuration of metal plasma gun, macroparticle filter, and current-driven homogenizer was used for thin film deposition, and was able to produce a relatively homogeneous film thickness profile while maintaining a deposition rate comparable to that at the peak point of the freely expanded beam at the same location. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 69 (1998), S. 3353-3356 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We describe a quantitative method of measuring film thickness profiles as deposited by plasma beams. Film thickness profiles are usually closely related to the plasma density profile of the depositing beam. The technique relies on the deposition of a semiopaque film over a large area transparent medium in situ and thus is particularly suitable for plasma systems used for thin film deposition. A simple and fast technique for quantifying the optical density versus position in the deposited film using a scanner and image processing software is described. The ability to quantify the relative optical density between different deposition profiles makes this a powerful tool for the study of the effects of process parameters on plasma density profiles and for the optimization of deposition systems. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 1287-1291 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The plasma generated by a silicon filtered cathodic vacuum arc has been investigated using a Faraday cup and Langmuir probes. Ion energy distributions for arc currents ranging from 30 to 80 A were measured. Mean ion energies were found to range from 8 to 18 eV. The ion saturation current density varied from 0.1 to 1 mA/cm2 depending on both the arc and filter coil currents. The energy distributions were fitted by a sum of Gaussians spaced according to the gas dynamic model for ion acceleration at the cathode spot. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 74 (1999), S. 2426-2428 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We describe a simple experiment in which a high voltage substrate is immersed in a streaming, vacuum-arc-produced, titanium plasma. We show that high substrate voltages that are orders of magnitude greater than the electron temperature can be sustained, effectively on a direct current basis, by a well-rounded substrate (no sharp points or edges) immersed in the plasma stream, for the case of a plasma with density not too low (greater than about 109 cm−3) and with drift velocity that is equal to or greater than the sheath propagation speed, typically of order the ion acoustic speed. This result is significant not only from a basic plasma physics perspective, but also for the technology of carrying out plasma immersion surface processing. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 71 (1997), S. 1777-1779 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The energy with which depositing species impinge on a growth surface is one of the main factors influencing the microstructure and properties of the thin films fabricated in plasma deposition processes. In this letter, we examine the effects of a variety of deposition parameters on the ion energy distribution beyond the magnetic filter in a filtered cathodic vacuum arc (FCVA). The results indicate that the ion energy distributions do not vary significantly with the magnetic field strength, magnetic field configuration, lateral position in the beam, or bias on the filter duct wall in the ranges studied. The energy distribution was however strongly affected by the presence of a reactive background gas. A reduction of 10 eV was recorded for a background pressure of 10−3 Torr of N2 gas in a carbon FCVA. This result has implications for all FCVA depositions carried out in a gas atmosphere and is consistent with the view that ion transport in the magnetic filter occurs due to an electrostatic guiding potential well. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 2965-2970 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report measurements of ion energy distributions of ionized species in titanium and aluminium filtered cathodic vacuum arcs operating in oxygen and nitrogen gas atmospheres. The ion energy distributions were recorded using a Hiden mass selected ion energy analyzer. The results show that a significant reduction in ion energies and a change in the shape of ion energy distributions occurs as the gas pressure is increased. The degree of the energy reduction depends on both the type of gas and the metal ions making up the arc plasma. This has important implications for the deposition of thin films, such as titanium nitride, commonly produced using vacuum arcs in reactive gas atmospheres. The ion energy distributions of the cathode ion species in the absence of background gas and at low gas pressures are well fitted by shifted Maxwellian distributions. As the gas pressure rises the distributions consist of a progressively increasing thermalized Maxwellian component and a decreasing shifted Maxwellian. An investigation of energy distributions of species in arcs triggered on alloyed cathodes showed that the relative abundance of ions of different charge states and their energy distributions varied as alloy metals were introduced. This indicates that the electron temperature in the cathode spot and hence the cathode spot dynamics is affected by the presence of the alloy metal. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 85 (1999), S. 6385-6391 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Curved magnetic filters are commonly used with cathodic vacuum arcs to remove macroparticles from the plasma stream, making it suitable for the preparation of smooth, dense, and defect free films. Although a variety of filters have been investigated experimentally, the influence of the magnetic field configuration on the shape and position of the plasma beam at the filter exit has not been recognized. In this work the magnetic field configurations for a wide range of filter designs have been calculated and compared with measured beam profiles. The results show that the field configurations can be used to predict the dimensions of the plasma beam and in-plane off-axis shifts at the filter exit, as well as identifying regions of high loss. Magnetic field configuration calculations are shown to be a valuable design and optimization tool for curved magnetic field filters of various designs. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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