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  • 1
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 59 (1991), S. 2567-2569 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The capability to detect and quantify sulfur at the part-per-billion (ppb) concentration level in ultrapure hydrochloric acid rinse solutions used in GaAs wafer fabrication is described. Nonvolatile residues formed from the deposition of nanoliter aliquots of solution onto high purity silicon wafers are analyzed using a high performance CAMECA IMS 4f ion microanalyzer. The dynamic SIMS analysis of microdroplet residues is referred to as Microvolume-SIMS (MV-SIMS). The Microvolume-SIMS analyses of two acid solutions are presented. The concentration of total sulfur detected in these solutions was 98 and 650 ppb; both values are below the SEMI specification standard of less than 1300 ppb total sulfur concentration. Despite this, the acid solution containing 650 ppb of total sulfur was responsible for causing an isolation failure halting wafer production. This finding corroborated electrical failure analyses using these same acids.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Journal of the American Chemical Society 105 (1983), S. 2916-2917 
    ISSN: 1520-5126
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 85 (1986), S. 1097-1103 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: The adsorption of Cl2 on Ag{110} at room temperature has been studied using angle-resolved static mode secondary ion mass spectrometry (SIMS), Auger spectroscopy, and LEED. The system has been examined over a coverage range from near zero to the p(2×1) overlayer structure observed by LEED. This structure could be produced by exposing the Ag{110} crystal to 2.5 L of Cl2. The Cl LMM Auger spectra exhibited a distinct change in shape at about 1.0 L exposure which is attributed to a change in the electronic structure of the Ag–Cl bond. In addition, the SIMS Cl− secondary ion yield deviated at this exposure from the expected exponential dependence on work function predicted by theory. An analysis of the secondary Cl− ion kinetic energy distributions, and the polar and azimuthal angle distributions also suggests that the Cl atom is highly charged in the limit of zero coverage with an extended Ag–Cl bond length over that of bulk AgCl. As the coverage approaches the 1.0 L Cl2 exposure point, however, there is significant weakening of surface dipoles due to adlayer interactions. This depolarization appears to be sufficient to allow significant contraction of the Ag–Cl bond length, such that the Cl atom may actually fall into the valley of the {110} surface. A submonolayer Cs overlayer appears to stabilize the negatively charged Cl adatoms, inhibiting the changes observed on the undoped Ag{110} surface. It is suggested that adlayer interactions which influence the formation of ordered overlayer structures mask important electronic and structural features of adsorbates which may only be observed in the single atom limit.
    Type of Medium: Electronic Resource
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