ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Epitaxial Ni films (2.0 nm〈h〈14 nm) have been grown on Cu/Si (001) and capped with 2.0 nm of Cu in a molecular beam epitaxy chamber. Their magnetic anisotropy has been measured ex situ in a vibrating sample magnetometer. Perpendicular magnetization is preferred over a broad Ni-thickness range: 25≤h≤140 A(ring). The quantitative anisotropy data are not well described by a model including bulk and surface magnetocrystalline anisotropy, Kb+Ksh, magnetostatic energy, and bulk magnetoelastic energy, Bbe(h). If surface magnetoelasticity Bse/h is considered, the data are well described and values for Ks and Bs consistent with Néel's model are determined. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.362144
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