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  • 1
    Electronic Resource
    Electronic Resource
    Stress in alkali halide films (1967)
    Springer
    Journal of materials science 2 (1967), S. 173-183 
    Details
    ISSN: 1573-4803
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract A detailed investigation has been made of the stress in alkali halide films evaporated onto glass, and it has been shown that this can be done satisfactorily by measuring the end deflection of a substrate using a surface probe. Initial difficulties arising from residual stress in the substrates have been largely overcome by carefully annealing the glass. The stress has been derived from the curve of observed deflection, plotted in terms of the force factor, against film thickness. A survey of the various models for explaining stress has been made and it has been shown that there are at least two, different, stress-producing mechanisms. In the early stages of growth, a misfit model is suggested, in which the oxygen sites in the glass surface act as preferred positions for the metal ions of the halide. The situation is not as clear in thicker films, but either a thermal expansion or a density model could provide a partial explanation.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00549577
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  • 2
    Electronic Resource
    Electronic Resource
    Stress in the components of a thin film silicon monoxide capacitor and its relationship to dielectric loss (1969)
    Springer
    Journal of materials science 4 (1969), S. 526-531 
    Details
    ISSN: 1573-4803
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract The cantilevered substrate technique has been used to measure the stress in aluminium and silicon monoxide films deposited in sequence on glass substrates. The stress is compressive in aluminium and tensile in silicon monoxide although the latter may be changed by prior exposure of the aluminium film to atmosphere. Electrical measurements were made on capacitors fabricated during the stress experiments. These showed that a definite relation existed between the dielectric loss and the stress. Possible reasons are suggested for these results.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00550213
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  • 3
    Electronic Resource
    Electronic Resource
    Conduction processes in vacuum-deposited films of silicon oxide (1969)
    Springer
    Journal of materials science 4 (1969), S. 259-265 
    Details
    ISSN: 1573-4803
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract DC and AC conduction measurements were made on films of silicon oxide which had been fully annealed. Four activation energies were determined for the conduction processes. In the case of DC conduction a time-dependent absorption current was observed at low fields and this was related to a low-frequency dispersion. The steady-state current at low fields was ohmic. At high fields the conductivity was field-dependent and the usual Jα exp (βV 1/2) relationship was observed. The low-frequency dispersion was found to affect the audio-frequency region at high temperatures. Above 10 kc/s the loss was independent of frequency up to 1 mc/s.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00549926
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  • 4
    Electronic Resource
    Electronic Resource
    The mechanism of reactive sputtering (1968)
    Springer
    Journal of materials science 3 (1968), S. 544-552 
    Details
    ISSN: 1573-4803
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract The reactive sputtering of tantalum in mixed argon/oxygen atmospheres at a total pressure of 3.0×10−4 torr has been investigated by means of measurements on deposition and growth rates, density, electrical properties and electron diffraction. The main controlling factor on all of the parameters was found to be the partial pressure of oxygen. The deposition rate was determined by the partial pressure of oxygen and assumed one of two values — either that associated with a clean tantalum target or that characteristic of an oxidised target. In the former region the oxygen content of the sputtered film was mainly dependent on the partial pressure of oxygen in the sputtering atmosphere and could range from zero to 100%. In the latter region, the films were always oxidised, but were deposited at a rate which was a fifth of that of the oxidised films sputtered under the former conditions. It is concluded that there is a critical oxygen pressure, below which tantalum metal is sputtered and undergoes reaction at the substrate, and above which tantalum oxide is sputtered from an oxide surface as the result of reaction at the target.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00549739
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  • 5
    Electronic Resource
    Electronic Resource
    Structural characterization of vulcanizates part X. Thiol-disulfide interchange for cleaving disulfide crosslinks in natural rubber vulcanizates (1969)
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 13 (1969), S. 1201-1214 
    Details
    ISSN: 0021-8995
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: The thiol-disulfide exchange reaction is shown to be applicable to cleavage of disulfide crosslinks in accelerated sulfur vulcanizates of natural rubber. The reaction, in conjunction with the previously reported selective cleavage of polysulfide crosslinks, is used to determine the distribution of crosslink types for several accelerated sulfur vulcanization systems as a function of cure time. Discrepancies between the results and published results obtained using the reagent sodium di-n-butyl phosphite for disulfide crosslink cleavage are discussed.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/app.1969.070130609
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  • 6
    Electronic Resource
    Electronic Resource
    Structural characterization of vulcanizates. XI. Network-bound accelerator residues (1970)
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 14 (1970), S. 1409-1419 
    Details
    ISSN: 0021-8995
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Radiotracer techniques have been used to determine amounts of accelerator which become bound to the vulcanizate networks during the vulcanization of NR with sulfur and CBS. Three different vulcanization systems have been studied, having different proportions of accelerator to sulfur. The vulcanizates have also been characterized in terms of the numbers and types of chemical crosslinks present and the results of the bound accelerator analyses have been considered in relation to the crosslink levels and distribution.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/app.1970.070140601
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  • 7
    Electronic Resource
    Electronic Resource
    The growth of single crystal films of silver on rocksalt by sputtering (1966)
    Springer
    Journal of materials science 1 (1966), S. 367-376 
    Details
    ISSN: 1573-4803
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract Thin films of silver on rocksalt have been prepared by diode sputtering in an argon discharge. Deposition rate, substrate temperature, and film thickness have been varied, and dependence of orientation on these parameters has been studied. Within a deposition rate range of 0.1 to 1.15Å/sec, films have been grown with (100) [110]Ag / / (100) [110]NaCl orientation, at temperatures in the range −35 to 0° C. Higher rates required higher temperatures. Films giving these results were all 200 Å in thickness. A thickness dependence of orientation has been observed for films below 120 Å in thickness. The above results are discussed in terms of the effect of arrival energy of the sputtered material at the substrate. The results of calculations, on the effect of gas pressure on the arrival energy, are presented and it is shown that, at 10−2 torr, up to 15% of the arriving atoms will have energies above 0.6 eV. That the observed rate, temperature, and thickness dependence of epitaxy are due to surface cleaning and penetration effects caused by the energy of arrival of the atoms is shown to be possible. The effect of charged particle bombardment of the substrate is also considered. It is shown that this may also be an important parameter affecting the growth.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00549935
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  • 8
    Electronic Resource
    Electronic Resource
    Structural characterization of vulcanizates. XII. Efficient vulcanization using a sulfenamide-thiuram disulfide accelerator system (1971)
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 15 (1971), S. 2661-2666 
    Details
    ISSN: 0021-8995
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Vulcanizates obtained from the sulfur vulcanization of natural rubber using a combination of the accelerators N-cyclohexylbenzothiazole-2-sulfenamide (CBS) and tetramethylthiuram disulfide (TMTD) have been analyzed in terms of the numbers of poly-, di-, and monosulfide crosslinks, network-bound accelerator residues, and cyclic sulfide chain modifications as a function of cure time. The vulcanization system produced mainly monosulfide crosslinks at optimum cure, although there were differences in detail between this mixed system and a previously reported efficient sulfur vulcanization (EV) system using a high ratio of CBS to sulfur.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/app.1971.070151106
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  • 9
    Electronic Resource
    Electronic Resource
    Effect of conjugated trienes on the oxidation of polyisoprenes (1969)
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 13 (1969), S. 1013-1022 
    Details
    ISSN: 0021-8995
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: The effect of low concentrations of conjugated triene on the rate of oxidation of polyisoprenes has been investigated. At concentrations similar to those expected to occur in sulfur vulcanizates of NR, conjugated trienes exert a significant accelerative effect on both the uninhibited and the inhibited oxidations of squalene. This accelerative effect is also present, but to a lesser extent, in the inhibited oxidation of carbon-carbon cross-linked NR vulcanizates.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/app.1969.070130516
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  • 10
    Electronic Resource
    Electronic Resource
    Surface analysis of aromatic polyimide films using ESCA (1979)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 1 (1979), S. 75-81 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: C 1s, N 1s and O 1s core spectra were measured for well-cured polyimide films of poly(N,N′-(p,p′-oxydiphenylene)promellitimide), and of poly(p,p′-oxybis(phenylene)-3,3′,4,4′-benzophenonetetracarboxylimide). Resolvable were: multiple C 1s, two N 1s and two O 1s components. A carbonyl deficiency not due to X-ray-induced decarboxylation was detected. Approximately 45% of the surface carbon matrix was found to be comprised of partially oxidized, non-carbonyl-containing moieties of unknown origin. C 1s chemical shift behavior showed that imide bond formation does occur on curing; the imidization reaction in the surface region is incomplete (or altered) based on the changes in the O 1s and N 1s data with increasing temperature of curing. A surface chemical structure inconsistent with the bulk structural formula is observed.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740010302
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